关键词: 工业硅, 单质硅, 二氧化硅, 氢氟酸直接挥发法, 高氯酸两次脱水法

Abstract: The true quality index of industrial silicon products is a single silicon content, but both methods of the subtraction and the hydrofluoric acid evaporation methods commonly used can not rule out the direct effect of silicon dioxide, leading to high silicon index. To this end, a new joint of hydrofluoric acid evaporation and perchloric acid dehydration is established to analyze single silicon content in industrial silicon. The new method can detect and recover single silicon and silicon dioxide in industrial silicon up to 99.57% ~ 100.03%. Due to this high accuracy, it is applicable for the analysis of industrial silicon with silicon content of 90.00% ~ 100.00 %.

Key words: Industrial silicon, Silicon, Dioxide silicon, Hydrofluoric acid evaporation, Perchloric acid dehydration