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Metal Mine ›› 2016, Vol. 45 ›› Issue (10): 185-188.

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Preparation of High Molecular Ratio Cryolite Using Invalid Phosphoric Acid Based Polishing Solution

Guo Changming,Wu Jun,Wei Liutuan,Cui Xuemin,Li Xuanhai   

  1. School of Chemistry and Chemical Engineering,Guangxi University,Nanning 530004,China
  • Online:2016-10-15 Published:2016-11-04

Abstract: By adding sodium fluoride in invalid phosphoric-based acid polishing solution to prepare high molecular ratio cryolite via sodium fluoride reaction with Al3+ from invalid phosphoric-based acid polishing solution.Results indicated that,with reaction temperature of 60 ℃,reaction time of 40 min,n(NaF)∶n(Al)=1.3,sedimentation time was 1.5 d,aluminum removal rate was 98.6%.The cryolite molecular ratio of NaF to AlF3 is 3.81.The production process not only recycled the polishing liquid,and production process is simple,cryolite has high molecular ratio and yield rate.It has good application prospect.

Key words: Invalid phosphoric-based acid polishing solution, Sodium fluoride, High molecular ratio cryolite, Precipitation